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Reflection High Energy Electron Diffraction (RHEED),
Low Energy Electron Diffraction (LEED),
X-ray Diffraction (XRD)
 The crystallographic
structure of materials can be monitored using electron
or x-ray diffraction techniques. The differentially
pumped reflection high energy electron diffraction
(RHEED) system included in the Thin
Film Synthesis and Characterization Facility can
monitor thin film structure during growth. This capability
is particularly important in epitaxial growth studies
since the structure of the first few monolayers of
nucleation and growth can be directly monitored in
real time.
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Low energy electron diffraction (LEED) is
an extremely sensitive probe to characterize
surface structure. LEED instruments are available
on several of our UHV chambers and are used
to analyze the surface structure following
gas adsorption, thin film growth, and surface
processing.
Information on crystalline structure and texture
is obtained using x-diffraction (XRD). A Scintag
XRD unit with a monochromatic source can be
configured for thin film work as well as conventional
XRD. Methods include Bragg-Brentano Θ-Θ geometry,
grazing incidence diffraction, rocking curves,
and Schultz pole figure geometry. |
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