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Facilities & Resources

Over the past three decades, LASST has developed a well-equipped facility for atomic level materials synthesis & processing, surface & interface characterization, and micro/nano-fabrication and testing of solid-state devices.  All instrumentation, support facilities, offices and administrative areas are housed in the Engineering Science Research Building attached to Barrows Hall.  The instrumentation has been established and is maintained through a combination of federal grants, state bonds, industry donations, and UMaine funding.

Several instruments are state-of-the-art research apparatus with unique capabilities; others allow more routine investigation using modern but well-established techniques.  The facilities include:

Clean Room Micro/Nano Fabrication Facility
(class 1000 with class 10 micro-environments)

Microlithography: Mask Aligners, Photoresist Spinners, Vapor Primer, Photoresist Asher, Laser Lithography and Machining System, Pattern Generator;  Thin Film Deposition: Electron Beam Evaporators, RF and Pulsed DC Sputter Deposition Systems, Plasma-Enhanced Chemical Vapor Deposition, Paralyne Coater, Atomic Layer Deposition;  Characterization: Surface Profilometer, Spectroscopic Ellipsometer;  Dry Etch: Deep Reactive Ion Etching (DRIE), Reactive Ion Etching (RIE);  Wet Etch:  Spin/Rinse/Dry, RCA Clean, KOH Etch, Solvent Benches;  Thermal Processing:   Four Stack Diffusion Furnaces, Rapid Thermal Annealing, Controlled Atmosphere Furnaces

Thin Film Synthesis and Processing
E-Beam Evaporation, Magnetron Sputtering, RF Plasma, Electron Cyclotron Resonance Plasma, Effusion Cell Evaporation, Ion Assisted Deposition, Chemical Vapor Deposition, Sol-Gel Synthesis, Atomic Layer Deposition

Electron Spectroscopies
X-ray Photoelectron (XPS), Ultraviolet Photoelectron (UPS), Auger Electron (AES), High Resolution Electron Energy Loss (HREELS)

Optical Spectroscopies
Infrared Specrometers with in situ Liquid / Gas Test Cells, Raman Spectroscopy and Microscopy, UV-Visible Absorption, Gas Chromatograph / Mass Spectrometer (GC/MS) with Chemical Ionization, Molecular Beam Dosers, Calibrated Thermal Desorption Spectroscopy, Langmuir-Blodgett Trough, Supercritical CO2 Processing, Particle Size Analysis, Fluorescence Microscopy, Nitrogen Adsorption Porosimetry and Surface Area Analyzer, Fixed Bed Catalytic Reactor with GCMS, Thermogravimetric Analyzer

Diffraction Analysis
Reflection High Energy Electron Diffraction (RHEED), Low Energy Electron Diffraction (LEED), X-ray Diffraction (XRD)

Surface Microscopies
Scanning Electron Microscopy, Focused Ion Beam, X-ray Fluorescence, Electron Beam Lithography, Scanning Tunneling Microscopy (STM), Atomic Force Microscopy (AFM), Optical Fluorescence

Nanomechanics and Tribology
Nanotribometer, Hysitron Picoindenter, Surface Profilometer, Pin-on-Disk

Sensor and Microelectronic Device Packaging
Wafer Dicing Saw, Ultrasonic and Wedge Wire Bonding, Laser Ablation Machining

Sensor Testing and Electronic Characterization
Hall Effect, Impedance Spectroscopy, 2-point & 4-point Conductivity, Capacitance-Voltage, Automated Gas Delivery Systems; High Temperature / High Pressure Furnace, Variable Temperature RF Probe Stations, Microwave Test Equipment, Data Acquisition / Integrated Electronic Test Suites

Molecular and Biochemical Analysis
Fluorescence Imaging, Microphotometry, Mass Spectrometry, Biosensor Devices

Theoretical Modeling
Surface and Interface Processes, Surface Phase Transitions, Devices / Instrumentation Design

Research Support Facilities
Electronics Shop, Thermal Processing, Helium Vacuum Leak Detector, Crystal Orientation and Polishing, Sample Preparation

 
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