The
processes that result in wear of polymer surfaces
are not well understood. This is particularly
true of the processes involved in the onset of
wear. In this paper, we describe the effects
of molecular weight (MW) and thermal processing
on the initial wear caused by a single asperity
sliding on a polystyrene surface. The asperity
is the silicon nitride tip of a Scanning Force
Microscope (SFM).
There
have been two previous studies of wear on polystyrene
using the SFM. Leung and Goh [1] studied 1 µm
thick films cast from solution in benzene, toluene,
and chloroform onto freshly cleaved mica and
then dried in air. They used pyramidal Si3N4 tips
and applied loads estimated to be about 10-7 N.
Surface deformation was induced by raster scanning
the tip over 2 µm x 2 µm areas at a speed of
about 17 µm/s. The deformation consisted of irregular
ridges approximately 50 nm wide with orientation
roughly perpendicular to the scan direction.
Ridges broadened and deepened with additional
scans. They report no obvious changes for MWs
between 32,000 and 573,000. The entanglement
MW for polystyrene is about 19k [2]. Leung and
Goh also report evidence for gradual transfer
of polystyrene to the tip. They did not discuss
possible mechanisms for the deformations.
Similar
ridge structures on polystyrene were also studied
by Meyer, DeKoven and Seitz (here after MDS)
[3] for MWs 13k to 1000k. They used films at
least 2 µm thick prepared by spin coating 2-12
wt% solution in toluene onto UV ozone treated
Si wafers and air drying at room temperature.
Si3N4 tips were used at
loads of about 1.5x10-8 N. The same
tip was used for all studies and contact pressures
were estimated to be larger than 40 MPa, which
is comparable to the tensile strength of polystyrene
(30-100 MPa) [4,5]. Tips were raster scanned
over 1µm x 1µm areas at 4.8 µm/s. During the
initial 15 min, the root-mean-square roughness
increased monotonically with larger increases
for larger MW. For higher MW samples, little
additional change in root-mean-square roughness
occurs after longer times. However, root-mean-square
roughness continues to increase for low MW (13k
to 35k) material. For example, it increased from
an initial value less than 1 nm to 5.6 nm for
24k MW after 45 min. The roughness is in the
form of ridges oriented approximately at right
angles to the scan direction with mean spacing l in
the range 50-100 nm. Simultaneously, a high ridge
of material builds up at one edge of the image
indicating that true wear has occurred. The modification
appears to be completed after about 60 min for
MW above 100k. Below 100k, the ridge structure
becomes more broken up. MDS [3] assume a power
law relationship between load and ridge spacing
in an attempt to correlate their results with
previous macroscopic studies of elastomers by
Schallamach [6] obtained at loads 5 orders of
magnitude larger than used by MDS. Based on this
extrapolation, which they do not justify on physical
grounds, they suggest that the surface of polystyrene
is elastomer like. We show in this paper that
the relationship between load and ridge spacing
is not power law.

The
polystyrene films used were cast out of a 2% solids
by weight toluene solution onto clean glass slides.
The glass was cleaned with a chromic and sulfuric
acid solution in an ultrasonic bath for 20 min,
followed by rinsing in distilled water, and then
baking in an oven at 150 C for 1 hour. The polystyrenes
were of two different molecular weights, 24k and
210k as measured by manufacturer (Aldrich Chemical
Company) using size exclusion chromatography. These
two molecular weights were chosen so that we could
compare to the two different regimes studied by
MDS [3]. 4 l drops of the toluene solution were
deposited onto the glass by micropipette. The solvent
was allowed to evaporate in air and the samples
were then placed in a vacuum desiccator and evacuated
to a few hundred mtorr for 20 minutes or longer.
Cast films had thickness values ranging from 0.6
to 1.0 m as measured by contact profilometry. Some
samples were also taken from the desiccator and
annealed in an oven at 130 C for 1 hour.
A Universal SFM (Park Scientific
Instruments) was used in these experiments. The
SFM (also called an atomic force microscope) is
a well established technique to image nonconducting
materials with nanometer resolution [7]. It has
also been used to cause wear on polymer surfaces
[1,3,8,9].
In the Universal SFM used for
these experiments, the sample is mounted on a piezoelectric
tube scanner and the sample position is controlled
with respect to the tip by voltages applied to
electrodes on the tube scanner. Typically, a sharp
tip is placed into contact with the sample at a
predetermined load and the sample is scanned under
the tip. During scanning, a feedback loop adjusts
the sample position to maintain constant load.
If the load is very small, typically a few nN,
the SFM functions as an imaging profilometer. If
the load is large enough, the tip can deform the
sample surface and cause wear. Lateral forces could
not be measured on this instrument.
The Si3N4 tips
were approximately conical in shape with an apex
angle of about 20 and a nominal end radius of 20
nm. The axis of the tip was inclined about 15 from
the normal to the substrate surface as shown in Figure
1. Each tip was mounted near the end of a triangular
cantilever beam force sensor (see
Fig. 1). Cantilevers (Park Scientific Instruments)
with nominal force constants of 0.03 N/m and 0.10
N/m were used. The load applied to the tip was
calculated from the measured cantilever deflection
and the nominal force constants using Hooke's Law.
Prior to each wear experiment,
the surface of the as-prepared polystyrene film
was imaged at low load (10-9 N) and
scan speed (8 m/s) with the SFM.
Each wear experiment consisted
of a fixed number of abrasion cycles. Each abrasion
cycle was carried out in the raster pattern illustrated
in the top view in Fig.
1. The
tip was scanned 4 micron in the +x direction
at constant speed and load. Loads used were in
the range 10 to 210 nN and the maximum speed was
320 micron/s. This speed is substantially larger
than the 20 mmicron/s used in previous studies
[1,3]. The direction was reversed at the end of
the scan and the initial path was retraced to its
starting point at the same speed and load. The
tip was then displaced 15.6 nm in the +y direction.
This cycle was repeated 256 times until the entire
4 micron by 4 micron area had been covered. This
constituted one abrasion cycle. Additional abrasion
cycles were carried out by returning the tip to
the origin and repeating the cycle. During a multi-cycle
wear experiment, the origin of the first few abrasion
cycles are displaced slightly because of hysteresis,
creep, and coupling between the x, y,
and z motions of the piezoelectric tube
scanner.
At the conclusion of each wear
experiment the load and scan speed were returned
to 10-9 N and 8 micron/s and the damaged
surface was imaged over a 6.5 micron by 6.5 micron area
so that the edges of the abraded area were included.
Each wear experiment was carried
out on a fresh surface and not on top of a previously
damaged region. Since the tip shape and cantilever
force constant vary slightly from one cantilever/tip
assembly to another, we always used the same tip
within each set of experiments. All experiments
were done under ambient conditions at room temperature
( 25 C) and approximately 40% relative humidity.

Before the induction of wear
all samples were imaged across a 4 micron by 4
micron area under loads 10-9 N and a
scan speed of 8 micron/s to characterize the surface
of the as-prepared film. Typical images can be
seen in Figure 2. As-prepared
surfaces for the 24k MW polystyrene (Fig.
2a) were the least smooth of the samples studied
with a root-mean-square roughness of 0.5 nm over
a 1 micron2 area. These surfaces had
two characteristic structural features: pits and
hillocks. The pits had dimensions on the order
of 80 nm in width and 10 nm in depth. The hillocks
were low (10 - 50 nm) and wide (0.4 - 1.5 micron).
The mechanisms responsible for the formation of
these structures are not understood. Annealed 24k
MW samples (Fig. 2b) had
slightly smaller root-mean-square roughness values,
but surface pits were absent and the hillocks were
barely discernible. 210k MW samples, both as cast (Fig.
2c) and annealed (Fig.
2d.), had root-mean-square roughness values
in the range of 0.3 nm - 0.4 nm without hillocks
or pits. The as-prepared surfaces were not usually
damaged by the tip during acquisition of these
images but occasionally, even at these gentle imaging
conditions, there was damage to the unheated 24k
MW surfaces.
Figure
3 shows 6.5 micron by 6.5 micron images of
typical wear patterns created on unannealed 24k
MW polystyrene surfaces using a load of 210 nN
and a scan speed of 160 micron/s. The abraded
regions in Fig. 3 have
several characteristic features. The most prominent
of these are the parallel ridges oriented perpendicular to
the scan direction. Ridge structures have been
reported previously on polystyrene [1,3] but
their orientation perpendicular to the scan direction
was not as strong as observed in the data presented
here. Another feature is the accumulation of
material at the top, and to a lesser extent at
the bottom, of the abraded areas. This transport
of material demonstrates that wear has occurred
as opposed to the localized plastic deformation
typically observed in microploughing on polymers
[8,9,10]. Similar accumulations were observed
on polyimides by Jin and Unertl [8] but were
not reported in the previous studies of polystyrene
[1,3]. More detailed studies are required to
determine wear rate. Material does not accumulate
at the pattern edges where the scan direction
changes, this is also similar to what is seen
on polyimides [8].
The parallel ridges have a
characteristic spacing that is independent of applied
load and number of wear cycles for the range of
conditions described here. The amplitude of the
ridges does increase with the number of abrasion
cycles as also reported before [3]. This is demonstrated
in Fig. 4a where we
have used the root-mean-square roughness as a measure
of the amplitude. The root-mean-square roughness
values for an applied load of 210 nN goes from
1.9 nm to 2.8 , 4.7, and 6.2 nm for 4, 7, 14, and
21 cycles respectively. This is in comparison to
a starting root-mean-square roughness of about
0.5 nm. The pit and hill structures seen
on the 24k MW starting surfaces do not effect the
development
of the parallel ridges.
The spacing of the parallel
ridges was dependent on the scan speed used during
the wear process. Figure
5 shows typical images for the case of wear
patterns induced with the same tip on a 24k MW
surface after 4 abrasion cycles with an applied
load of 210 nN at varying scan speeds. Figure
4b plots the ridge spacing as a function of
scan speed. At a scan speed of 80 micron/s ridges
were not well enough formed to define a unique
ridge spacing. At higher speeds the spacing increased
approximately linearly with scan speed. Upon closer
inspection the patterns formed at lower scan speeds
appear very similar to the patterns seen in the
experiments by Leung and Goh [1] and MDS [3]. Ridge
patterns formed at lower applied loads are also
not as regularly spaced. One spin coated 24k MW
sample was also abraded and formed patterns consistent
with those found on the cast samples.
Development of abrasion patterns
on the 210k MW surfaces were carried out under
similar conditions to those described above. The
210k MW surfaces developed a pattern with a smaller
ridge spacing than was seen on the 24k MW surface.
An example of this pattern for an unannealed 210k
MW film is shown in Fig.
6. For this example six abrasion cycles were
carried out at an applied load of 148 nN and a
speed of 160 micron/s.
The initial 210k MW surface root-mean-square roughness
was 0.4 nm and increased to 1.0 nm after abrasion.
The resulting abrasion pattern shows well developed
ridges likes those formed on 24k MW films. One
difference is apparent near the top and bottom
of the abraded region shown in Fig.
6. Near these edges there are only half as
many ridges as in the rest of the abraded area.
This bifurcation was not seen on the 24k MW samples
and the mechanism by which it forms is not currently
understood.
The 210k MW samples were generally
slightly more resistant to wear than the 24k MW
samples for similar abrasion conditions. This result
is in disagreement with the previous work done
by Leung and Goh [1], but appears to agree with
MDS [3] who report less roughening on high molecular
weight polystyrene for long abrasion times.
The annealed 24k and 210k MW
samples also developed abrasion patterns that were
similar to those formed on the unannealed samples
except that a higher applied load was required
to obtain similar ridge heights. Clearly, annealing
at 130 C increases the resistance of polystyrene
surfaces to wear under the room temperature conditions
of our wear experiments. Figure
7 compares the case of two 24k MW samples,
one as cast (Fig. 7a) and
one annealed (Fig. 7b),
for which wear patterns were formed with the same
tip under an applied load of 41 nN and a scan speed
of 160 micron/s. Twenty abrasion cycles were carried
out on each specimen. The initial root-mean-square
roughness value of the annealed sample was 0.5
nm and increased to about 0.7 nm after abrasion
where as, initial and final root-mean-square roughness
for the as cast samples were 0.5 nm and 0.8 nm,
respectively.

Our experimental observations
follow the same general trends with MW as observed
for the tensile, flexure, and impact strengths
of bulk polystyrene. For example, the tensile strength
of polystyrene is a strong function of MW [4].
Below 80k MW, the tensile strength of bulk polystyrene
is low; i.e. less than 2 MPa. Above 80k MW, it
increases rapidly, reaching a saturation value
of 35-40 MPa by about 160k MW. In contrast, the
hardness and modulus of elasticity are independent
of MW for bulk samples [4,5].
The applied loads above
which plastic deformation is expected to occur
can be
estimated from bulk mechanical properties using
contact mechanics. In the case of an elastic Hertzian
contact between an undeformable sphere of radius R and
a soft planar surface with modulus E and
Poisson ratio [11,12], the radius a of the
contact and the average pressure P are given
by:

and

respectively, where F is
the applied load. For the present experiment R=20
nm, E=3.5 GPa [4,5], and v = 0.333 [4,5]. Using
Eqn. 1, the Hertzian contact radius can be calculated
assuming bulk mechanical parameters; e. g., for R =
20 nm, a varies from 1.6 nm for F =
10 nN up to 9.3 nm for F = 210 nN. However,
the actual contact areas are larger in most cases
studied because plastic deformation occurs at these
loads because P, Eqn. 2, exceeds the yield
strength of polystyrene. P is plotted in Fig.
8 for the case R = 20 nm. Also shown
as horizontal lines in the figure are the pressures
at which the bulk is expected to become fully plastic
based on the criterion that plasticity occurs at
about three times the yield stress [12]. The upper
line is for MWs above 160k and the lower line is
for MWs below 80k. This Hertzian analysis suggests
that both 24k and 210k MW polystyrene should be
fully plastic under all of the conditions of the
experiments described here.
The effects of interfacial
adhesion between the tip and the substrate can
be important but are not included in the Hertzian
analysis. According to the JKR theory of adhesive
contacts [13]

and

where 2g is
the work of adhesion between the tip and polystyrene.
Clearly, aJKR > a.
This increase in contact area results in a decrease
in average pressure for a given applied load; i.e.,
the load for which plastic deformation will occur
is underestimated by Eqns. 1 and2.
In JKR theory, g is
related to the pull-off force, Fp,
by

where Fp is
defined as the force required to separate the tip
from the substrate. Experimentally, we find that
|Fp| for our tip-substrate combination
was always less than 20 nN. Thus, for a tip with R =
20 nm, aJKR is as large as 2.15a =
3.4 nm for F = 10 nN and 1.23a =
11.4 nm for F =210 nN. The contact pressure PJKR,
Eqn. 4, calculated using Fp =
-20 nN is shown in Fig. 8.
Both JKR and Hertzian theories show that the 24k
MW polystyrene is expected to be fully plastic
for all loads above a few nN. However, the JKR
analysis predicts that the 210k MW polystyrene
does not reach the fully plastic regime until the
load exceeds 20 nN. This correlates surprisingly
well with our observations considering the simplicity
of this model compared to the experimental case
of sliding contact. However, the results do suggest
that adhesive interactions between the tip and
substrate are an important component in a more
detailed model of the wear of polystyrene.
MDS [3] speculate that ridge
formation on polystyrene may be due to a Schallamach
abrasion mechanism [6,14]. Specifically, by comparison
of their data with previously published results
obtained above 4 mN, they attempt to show that
the applied load has a power law dependence on
ridge spacing; i.e., F lm where l is
the ridge spacing. MDS give no physical motivation
for a power law relationship between F and l.
From Fig. 5 in MDS, we estimate that 0.7 < m < 2.5.
Based on this power law extrapolation, MDS suggest
that the surface of polystyrene is more elastomer
like than bulk polystyrene. Our measurements show
that l and F are independent and
rule out a power relationship for loads in the
range 10 nN - 210 nN which includes the 15 nN load
used by MDS.

We
have used a scanning force microscope to study
the initial stages of wear on polystyrene films
with molecular weights of 24k and 210k. The films
were cast from toluene solution and dried in vacuum.
Wear was induced by multiple cycles of raster scanning
the SFM tip over the surface at loads in the range
10 nN to 210 nN.
In general, we find that high
molecular weight films are more resistant to wear
than low molecular weight films. We also find that
wear occurs more easily on the as-cast films and
that heating the films to 130 C increases their
wear resistance at room temperature. The mechanism
for this is not understood at present. However,
there are at least two possible sources of this
increased abrasion resistance. One is that toluene
trapped in the as-prepared film is removed by annealing.
The other is that the configuration of polymer
chains changes upon annealing above Tg.
Additional experiments are required to understand
this phenomenon.
In agreement with previous
studies [1,3], we find that SFM induced abrasion
of polystyrene is characterized by the formation
of parallel ridges oriented perpendicular to the
direction of motion of the SFM tips. However, we
show explicitly that the ridge spacing is independent
of the applied load. This result casts doubt on
the conjecture by MDS [3] that a Schallamach mechanism
is responsible for the ridges and that the surface
of polystyrene is more elastomer like than bulk
polystyrene.

This
work was supported in part by the Department of
Energy, the Maine Science and Technology Foundation,
and the industrial sponsors of the Paper Surface
Science Program at the University of Maine.

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